Dr Eva Blasco (left) had come from Karlsruhe to Hanover to talk about "Two-photon Lithography: New Materials and Challenges". According to Blasco two-photon lithography has been stablished during the last few years as the most suitable 3D printing technique to fabricate small features with very high resolution (below 1 micron). "Our goal at KIT (Karlsruhe Institute of Technology) is to develop new materials (inks) for this technology and enable in the near futures its use in industry: e.g. 3D printing of small parts of our daily use devices, such as mobile phones", Blasco said.
The lecture by the second speaker, Dr Lei Zheng, was entitled "Optical fabrication and characterization of 2D and 3D plasmonic and photonic microdevices". "My research focuses on the fabrication and characterization of optical micro- and nanodevices for sensing and communication applications, which might be further used in products, e.g. smartphones, cameras and computers." Born in China, Ms Zheng joined this May the research team of the Hannover Centre for Optical Technologies (HOT), which is part of the PhoenixD cluster of excellence.
